Wednesday, September 14, 2016

Installation and Operation Manual for Brooks GF100 Series

Brooks GF100 Series
Brooks GF100 Series
The Brooks GF100 Series thermal mass flow controllers and meters provide fast responding, repeatable delivery of process gases with high and ultra-high levels of purity. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFlo technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy resulting in increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity.

Applications include:
  1. Semiconductor etch tools
  2. Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
  3. Physical vapor deposition (PVD) systems
  4. Epitaxial process systems
Below is the installation and operation manual for the GF100 Series. The entire document can also be downloaded from the BCE site here.